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在金箔上合成厘米级单层二硫化钨薄膜。

Synthesis of centimeter-scale monolayer tungsten disulfide film on gold foils.

机构信息

†IBS Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS), Sungkyunkwan University, Suwon 440-746, Republic of Korea.

⊥Institute of Advanced Composite Materials, Korea Institute of Science and Technology (KIST), San101 Eunha-Ri, Bongdong-Eup, Wanju-Gun, Jeollabuk-Do 565-902, Republic of Korea.

出版信息

ACS Nano. 2015 May 26;9(5):5510-9. doi: 10.1021/acsnano.5b01529. Epub 2015 Apr 20.

Abstract

We report the synthesis of centimeter-scale monolayer WS2 on gold foil by chemical vapor deposition. The limited tungsten and sulfur solubility in gold foil allows monolayer WS2 film growth on gold surface. To ensure the coverage uniformity of monolayer WS2 film, the tungsten source-coated substrate was placed in parallel with Au foil under hydrogen sulfide atmosphere. The high growth temperature near 935 °C helps to increase a domain size up to 420 μm. Gold foil is reused for the repeatable growth after bubbling transfer. The WS2-based field effect transistor reveals an electron mobility of 20 cm(2) V(-1) s(-1) with high on-off ratio of ∼10(8) at room temperature, which is the highest reported value from previous reports of CVD-grown WS2 samples. The on-off ratio of integrated multiple FETs on the large area WS2 film on SiO2 (300 nm)/Si substrate shows within the same order, implying reasonable uniformity of WS2 FET device characteristics over a large area of 3 × 1.5 cm(2).

摘要

我们通过化学气相沉积法合成了厘米级的金箔上单层 WS2。金箔中钨和硫的溶解度有限,这使得单层 WS2 薄膜能够在金表面生长。为了确保单层 WS2 薄膜的覆盖率均匀,将涂有钨源的基底与金箔平行放置在硫化氢气氛下。接近 935°C 的高生长温度有助于将畴尺寸增加到 420 μm。金箔在冒泡转移后可重复使用以进行重复生长。基于 WS2 的场效应晶体管在室温下具有 20 cm(2) V(-1) s(-1) 的电子迁移率和高达 ∼10(8)的高开关比,这是之前报道的 CVD 生长 WS2 样品中的最高值。在 SiO2(300nm)/Si 衬底上大面积 WS2 薄膜上集成的多个 FET 的开关比也处于同一数量级,这表明在 3×1.5cm(2)的大面积上 WS2 FET 器件特性具有合理的均匀性。

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