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XeF2 暴露下产生的氟化石墨烯的化学稳定性。

Chemical stability of graphene fluoride produced by exposure to XeF2.

机构信息

Nova Research , 1900 Elkins Street Suite 230, Alexandria, Virginia 22308, United States.

出版信息

Nano Lett. 2013 Sep 11;13(9):4311-6. doi: 10.1021/nl4021039. Epub 2013 Aug 30.

Abstract

Fluorination can alter the electronic properties of graphene and activate sites for subsequent chemistry. Here, we show that graphene fluorination depends on several variables, including XeF2 exposure and the choice of substrate. After fluorination, fluorine content declines by 50-80% over several days before stabilizing. While highly fluorinated samples remain insulating, mildly fluorinated samples regain some conductivity over this period. Finally, this loss does not reduce reactivity with alkylamines, suggesting that only nonvolatile fluorine participates in these reactions.

摘要

氟化可以改变石墨烯的电子性质,并激活后续化学反应的活性位点。在这里,我们表明,石墨烯的氟化取决于几个变量,包括 XeF2 的暴露和衬底的选择。氟化后,氟含量在几天内下降 50-80%,然后稳定下来。虽然高度氟化的样品仍然是绝缘的,但在这段时间内,轻度氟化的样品恢复了一些导电性。最后,这种损失并没有降低与烷基胺的反应性,这表明只有非挥发性氟参与了这些反应。

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