γ-射线辐照引发有机硅烷对氧化石墨烯的功能化。

Gamma-Irradiation Induced Functionalization of Graphene Oxide with Organosilanes.

机构信息

Department of Chemistry, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor, Malaysia.

Materials Processing and Technology Laboratory, Institute of Advanced Technology, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor, Malaysia.

出版信息

Int J Mol Sci. 2019 Apr 18;20(8):1910. doi: 10.3390/ijms20081910.

DOI:10.3390/ijms20081910

PMID:31003413

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6514852/

Abstract

Gamma-ray radiation was used as a clean and easy method for turning the physicochemical properties of graphene oxide (GO) in this study. Silane functionalized-GO were synthesized by chemically grafting 3-aminopropyltriethoxysilane (APTES) and 3-glycidyloxypropyltrimethoxysilane (GPTES) onto GO surface using gamma-ray irradiation. This established non-contact process is used to create a reductive medium which is deemed simpler, purer and less harmful compared conventional chemical reduction. The resulting functionalized-GO were characterized by Fourier transform infrared spectroscopy (FT-IR), X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), thermogravimetric analysis (TGA), and Raman spectroscopy. The chemical interaction of silane with the GO surface was confirmed by FT-IR. X-ray diffraction reveals the change in the crystalline phases was due to surface functionalization. Surface defects of the GO due to the introduction of silane mioties was revealed by Raman spectroscopy. Thermogravimetric analysis of the functionalized-GO exhibits a multiple peaks in the temperature range of 200-650 °C which corresponds to the degradation of chemically grafted silane on the GO surface.

摘要

伽马射线辐射被用作一种清洁且简便的方法，用于改变本研究中氧化石墨烯（GO）的物理化学性质。通过伽马射线辐照，将 3-氨丙基三乙氧基硅烷（APTES）和 3-缩水甘油丙基三甲氧基硅烷（GPTES）化学接枝到 GO 表面上，合成了硅烷功能化-GO。这种建立的非接触工艺用于创建一种还原介质，与传统的化学还原相比，该还原介质被认为更简单、更纯净、危害更小。通过傅里叶变换红外光谱（FT-IR）、X 射线衍射（XRD）、场发射扫描电子显微镜（FE-SEM）、热重分析（TGA）和拉曼光谱对功能化-GO 进行了表征。FT-IR 证实了硅烷与 GO 表面的化学相互作用。X 射线衍射表明，由于表面功能化，晶体相发生了变化。拉曼光谱揭示了由于引入硅烷米体导致 GO 表面存在表面缺陷。功能化-GO 的热重分析在 200-650°C 的温度范围内显示出多个峰值，这对应于 GO 表面化学接枝的硅烷的降解。