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筛选工程化的MoS/单壁碳纳米管网络异质结垂直场效应晶体管中的高效栅极调制

Efficient Gate Modulation in a Screening-Engineered MoS/Single-Walled Carbon Nanotube Network Heterojunction Vertical Field-Effect Transistor.

作者信息

Phan Thanh Luan, Vu Quoc An, Kim Young Rae, Shin Yong Seon, Lee Il Min, Tran Minh Dao, Jiang Jinbao, Luong Dinh Hoa, Liao Lei, Lee Young Hee, Yu Woo Jong

机构信息

Key Laboratory for Micro-/Nano-Optoelectronic Devices of the Ministry of Education, School of Physics and Electronics , Hunan University , Changsha 410082 , China.

出版信息

ACS Appl Mater Interfaces. 2019 Jul 17;11(28):25516-25523. doi: 10.1021/acsami.9b05335. Epub 2019 Jul 2.

Abstract

In this report, a screening-engineered carbon nanotube (CNT) network/MoS/metal heterojunction vertical field effect transistor (CNT-VFET) is fabricated for an efficient gate modulation independent of the drain voltage. The gate field in the CNT-VFET transports through the empty space of the CNT network without any screening layer and directly modulates the MoS semiconductor energy band, while the gate field from the Si back gate is mostly screened by the graphene layer. Consequently, the on/off ratio of CNT-VFET maintained 10 in overall drain voltages, which is 10 times and 1000 times higher than that of the graphene (Gr) VFET at = 0.1 (ratio = 81.9) and 1 V (ratio = 3), respectively. An energy band diagram simulation shows that the Schottky barrier modulation of CNT/MoS contact along the sweeping gate bias is independent of the drain voltage. On the other hand, the gate modulation of Gr/MoS is considerably reduced with increased drain voltage because more electrons are drawn into the graphene electrode and screens the gate field by applying a higher drain voltage to the graphene/MoS/metal capacitor.

摘要

在本报告中,制备了一种用于高效栅极调制且与漏极电压无关的筛选工程碳纳米管(CNT)网络/MoS/金属异质结垂直场效应晶体管(CNT-VFET)。CNT-VFET中的栅极电场通过CNT网络的空隙传输,无需任何筛选层,直接调制MoS半导体能带,而来自Si背栅的栅极电场大部分被石墨烯层屏蔽。因此,CNT-VFET在整个漏极电压范围内的开/关比保持为10,分别比石墨烯(Gr)VFET在 = 0.1(比值 = 81.9)和1 V(比值 = 3)时高10倍和1000倍。能带图模拟表明,沿扫描栅极偏压的CNT/MoS接触的肖特基势垒调制与漏极电压无关。另一方面,随着漏极电压增加,Gr/MoS的栅极调制显著降低,因为更多电子被吸引到石墨烯电极中,并通过向石墨烯/MoS/金属电容器施加更高的漏极电压来屏蔽栅极电场。

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