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梯形分子和聚合物的设计、合成与表征。通过实验和理论研究,开发出空气稳定、溶液可加工的 n 型和双极性半导体薄膜晶体管。

Design, synthesis, and characterization of ladder-type molecules and polymers. Air-stable, solution-processable n-channel and ambipolar semiconductors for thin-film transistors via experiment and theory.

机构信息

Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA.

出版信息

J Am Chem Soc. 2009 Apr 22;131(15):5586-608. doi: 10.1021/ja809555c.

Abstract

The design, synthesis, and characterization of new high-performance n-channel molecular/polymeric semiconductors that are solution-processable and air-stable is of great interest for the development of p-n junctions, bipolar transistors, and organic complementary circuitry (CMOS). While over the past two decades there have been many reports on n-channel materials, solution-processability and air-stability still remain as major challenges. We report here the synthesis and detailed characterization of a highly electron-deficient class of indeno[1,2-b]fluorene-6,12-dione, 2,2'-(indeno[1,2-b]fluorene-6,12-diylidene) dimalononitrile, bisindenofluorene-12,15-dione, and 2,2'-(bisindenofluorene-12,15-diylidene) dimalononitrile-based ladder-type building blocks (1-12) and their corresponding homo- and copolymers (P1-P14), and examine in detail the effects of core size, thiophene vs core regiochemistry, carbonyl vs dicyanovinylene functionality, and alkyl chain orientation on the physicochemical properties, thin film microstructures, and OFET device performance. New compounds are characterized by DSC, TGA, melting point, single-crystal X-ray diffraction (XRD), solution/thin film optical, PL, and cyclic voltammetry measurements to evaluate frontier molecular orbital energetics and intermolecular cohesive forces. Thin films are grown by vacuum deposition and spin-coating, and investigated by X-ray diffraction (XRD) and AFM. By tuning the HOMO/LUMO energetics of the present materials over a 1.1 eV range, p-type, n-type, or ambipolar charge transport characteristics can be observed, thus identifying the MO energetic windows governing majority carrier polarity and air stability. One of these systems, thiophene-terminated indenofluorenedicyanovinylene 10 exhibits an electron mobility of 0.16 cm(2)/V x s and an I(on)/I(off) ratio of 10(7)-10(8), one of the highest to date for a solution-cast air-stable n-channel semiconductor. Here we also report solution-processed ambipolar films of thiophene-based molecule 12 and copolymers P13 and P14 which exhibit electron and hole mobilities of 1 x 10(-3)-2 x 10(-4) and I(on)/I(off) ratios of approximately 10(4), representing the first examples of molecular and polymeric ambipolar semiconductors to function in air. Analysis of the operational air-stabilities of a series of thin films having different crystallinities, orientations, and morphologies suggests that operational air-stability for thermodynamically predicted (i.e., no kinetic barrier contribution) air-stable semiconductors is principally governed by LUMO energetics with minimal contribution from thin-film microstructure. The onset LUMO energy for carrier electron stabilization is estimated as -4.0 to -4.1 eV, indicating an overpotential of 0.9-1.0 eV. Density functional theory calculations provide detailed insight into molecule/polymer physicochemical and charge transport characteristics.

摘要

我们报告了一类高度缺电子的茚并[1,2-b]芴-6,12-二酮、2,2'-(茚并[1,2-b]芴-6,12-二亚基)二丙二腈、双茚并芴-12,15-二酮和 2,2'-(双茚并芴-12,15-二亚基)二丙二腈基梯形建筑块(1-12)及其相应的均聚物和共聚物(P1-P14)的合成和详细表征,并详细研究了核心尺寸、噻吩与核心区域化学、羰基与二氰基乙烯基官能团、烷基链取向对物理化学性质、薄膜微结构和 OFET 器件性能的影响。通过差示扫描量热法(DSC)、热重分析(TGA)、熔点、单晶 X 射线衍射(XRD)、溶液/薄膜光学、PL 和循环伏安法测量来评估前沿分子轨道的能量和分子间内聚能。通过真空沉积和旋涂生长薄膜,并通过 X 射线衍射(XRD)和原子力显微镜(AFM)进行研究。通过调节本材料的 HOMO/LUMO 能隙在 1.1eV 的范围内,可以观察到 p 型、n 型或双极性电荷输运特性,从而确定了控制多数载流子极性和空气稳定性的 MO 能隙。这些系统中的一种,噻吩端基茚并芴二氰基乙烯基 10 表现出 0.16cm2/V x s 的电子迁移率和 10(7)-10(8)的 I(on)/I(off)比值,这是迄今为止报道的溶液浇铸空气稳定 n 通道半导体中最高的之一。在这里,我们还报告了基于噻吩的分子 12 和共聚物 P13 和 P14 的溶液处理的双极薄膜,其表现出 1x10(-3)-2x10(-4)的电子和空穴迁移率和大约 10(4)的 I(on)/I(off)比值,这是第一个在空气中起作用的分子和聚合物双极半导体的例子。对具有不同结晶度、取向和形态的一系列薄膜的操作空气稳定性的分析表明,对于热力学预测的(即,没有动力学障碍贡献)空气稳定半导体的操作空气稳定性主要由 LUMO 能隙决定,薄膜微结构的贡献最小。载流子电子稳定的起始 LUMO 能量估计为-4.0 至-4.1eV,表明过电势为 0.9-1.0eV。密度泛函理论计算提供了对分子/聚合物物理化学和电荷输运特性的详细了解。

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