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可重复使用的 MoS 修饰的抗菌织物,具有光热消毒性能,可重复使用个人防护口罩。

Reusable MoS-Modified Antibacterial Fabrics with Photothermal Disinfection Properties for Repurposing of Personal Protective Masks.

机构信息

School of Basic Sciences, Indian Institute of Technology Mandi, Kamand, Mandi, Himachal Pradesh 175005, India.

出版信息

ACS Appl Mater Interfaces. 2021 Mar 24;13(11):12912-12927. doi: 10.1021/acsami.1c00083. Epub 2021 Mar 9.

Abstract

The current pandemic caused by SARS-CoV-2 has seen a widespread use of personal protective equipment, especially face masks. This has created the need to develop better and reusable protective masks with built-in antimicrobial, self-cleaning, and aerosol filtration properties to prevent the transmission of air-borne pathogens such as the coronaviruses. Herein, molybdenum disulfide (MoS) nanosheets are used to prepare modified polycotton fabrics having excellent antibacterial activity and photothermal properties. Upon sunlight irradiation, the nanosheet-modified fabrics rapidly increased the surface temperature to ∼77 °C, making them ideal for sunlight-mediated self-disinfection. Complete self-disinfection of the nanosheet-modified fabric was achieved within 3 min of irradiation, making the fabrics favorably reusable upon self-disinfection. The nanosheet-modified fabrics maintained the antibacterial efficiency even after 60 washing cycles. Furthermore, the particle filtration efficiency of three-layered surgical masks was found to be significantly improved through incorporation of the MoS-modified fabric as an additional layer of protective clothing, without compromising the breathability of the masks. The repurposed surgical masks could filter out around 97% of 200 nm particles and 96% of 100 nm particles, thus making them potentially useful for preventing the spread of coronaviruses (120 nm) by trapping them along with antibacterial protection against other airborne pathogens.

摘要

当前由 SARS-CoV-2 引起的大流行,人们广泛使用个人防护设备,尤其是口罩。这就需要开发具有内置抗菌、自清洁和过滤气溶胶功能的更好的可重复使用的防护口罩,以防止空气传播病原体(如冠状病毒)的传播。在此,二硫化钼(MoS)纳米片被用于制备具有优异抗菌活性和光热性能的改性涤棉织物。在阳光照射下,纳米片改性织物迅速将表面温度升高到约 77°C,使其成为阳光介导的自消毒的理想选择。在照射 3 分钟内,纳米片改性织物即可实现完全自消毒,使其在自消毒后可重复使用。纳米片改性织物即使经过 60 次洗涤循环,仍保持其抗菌效率。此外,通过将 MoS 改性织物作为附加的防护服层纳入,三层手术口罩的颗粒过滤效率得到了显著提高,而不会影响口罩的透气性。经过重新利用的手术口罩可以过滤掉约 97%的 200nm 颗粒和约 96%的 100nm 颗粒,因此,它们可以通过捕获冠状病毒(120nm)并结合对其他空气传播病原体的抗菌保护来阻止冠状病毒的传播,从而具有潜在的应用价值。

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